Semiconductor Magnetron Sputtering Coating

Semiconductor Magnetron Sputtering Coating Equipment

Semiconductor Magnetron Sputtering Coating Equipment.png

Semiconductor Magnetron Sputtering Coating Equipment

Brand: NAURA

Model: Polaris B630

Function: The Polaris series PVD system is mainly composed of an atmospheric platform, a vacuum transmission platform, a degassing chamber (Degas), a pre-cleaning chamber and a process chamber. The equipment adopts a Cluster Tool structure and can be configured with multiple process chambers, pre-cleaning chambers and degassing chambers. It is suitable for large-scale production of thin film preparation in the packaging field. The Polaris series PVD is a fully automatic high-capacity equipment with the characteristics of automatic opening and closing of the reaction chamber cover, automatic wafer transmission, process degassing, wafer surface pre-cleaning, and fully automated thin film deposition.


RELATED NEWS