Vacuum Evaporation Coating Equipment

Vacuum evaporation coating equipment-OTFC

Brand: OPTORUN

Model: OTFC1550

Function: OTFC is Optoun's best-selling vacuum evaporation optical coating equipment. It is mainly used to produce AR coatings of medium difficulty, infrared cut-off filters and other products. Thanks to its excellent cavity size, it can effectively reduce the cost of product production.

Electron Beam Evaporation Coating Equipment

Ion Beam Assisted Evaporation Coating Equipment

Brand: Leybold

Model: Syrus Pro 1950

Function: Syrus Pro 1910 is mainly used for optical thin film evaporation such as multi-band optical anti-reflection film, high reflection film, cut-off filter, narrow band, ultra-narrow band, and ultra-narrow band filter. It is equipped with three electron guns, resistance heating evaporation source and plasma auxiliary source. It can evaporate multiple samples of different sizes at one time. At the same time, the size of our Syrus pro coating umbrella is 1910mm, which can prepare large-sized optical coating products. At the same time, the output of a single furnace is much higher than that of common equipment on the market. In addition, in terms of single-layer coating, the thickness uniformity of the oxide can be controlled at 1%.

Ion Beam Sputtering Coating Equipment

Ion Beam Assisted Evaporation Coating Equipment

Brand: Leybold

Model: IBS

Function: The IBS series offers ion beam sputtering technology with ultra-low optical coating losses, ideal for high-precision coatings for laser optics, gyroscopes, metrology, microscopy, telecommunications and other demanding applications.

Dual Ion Beam Sputtering Coating

Dual Ion Beam Sputtering Coating Machine

Brand: VECCO

Model: SPECTOR HT

Function: The film coated by SPECTOR HT has low scattering loss and high film purity. The controllable film thickness is less than 0.1 nanometer. SPECTOR can be used to produce optical components such as AR coatings, complex non-quarter-wavelength coatings, and laser reflectors with ultra-low absorption loss and scattering. Advantages of the produced film: good stacking density, low pinhole density, and high film purity.

We mainly use SPRCTOR HT to produce ultra-narrowband filters, and apply them to markets such as aerospace, military, medical, and instruments that have extremely high requirements for filter accuracy.

Optical Magnetron Sputtering Coating

Optical magnetron sputtering coating equipment

Brand: Leybold

Model: Helios 800

Function: HELIOS 800 sputtering coater is designed to meet the high requirements of thin film preparation. Suitable for linear lasers, deep cut-off filters and notch filters, lasers and chirped mirrors, polarizers, beam splitters, biosensors and ADAS sensors or consumer electronics. Mainly used in biomedical, instrumentation, 3D sensing and other markets.

Atomic Layer Deposition Coating

Atomic Layer Deposition Coating Equipment

Brand: Beneq

Model: TFS-500

Function: TFS 500 can handle many types of substrates; chips, planar objects, granular and porous materials, and complex 3D objects with high aspect ratio features. It can also be equipped with a manually operated load lock to increase chip processing capabilities. Different types of reaction chambers can be easily installed in the vacuum chamber, allowing each reaction chamber to be optimized for each customer application.

Semiconductor Magnetron Sputtering Coating

Semiconductor Magnetron Sputtering Coating Equipment

Brand: NAURA

Model: Polaris B630

Function: The Polaris series PVD system is mainly composed of an atmospheric platform, a vacuum transmission platform, a degassing chamber (Degas), a pre-cleaning chamber and a process chamber. The equipment adopts a Cluster Tool structure and can be configured with multiple process chambers, pre-cleaning chambers and degassing chambers. It is suitable for large-scale production of thin film preparation in the packaging field. The Polaris series PVD is a fully automatic high-capacity equipment with the characteristics of automatic opening and closing of the reaction chamber cover, automatic wafer transmission, process degassing, wafer surface pre-cleaning, and fully automated thin film deposition.